本研究利用合環及鈀(0)的催化，碳氮鍵偶合，在2,7位置導入苯胺，形成穩定的咔唑(carbazole) 衍生物。
這一系列的carbazole衍生物(CBH22, CBE22, CBE33, CBH44, CBE44, CBE441) ，具有優良的熱穩定性質，熱裂解溫度(Td)在334 oC，玻璃轉換溫度(Tg) 在111-196 oC的範圍，而發光範圍由藍光到綠光。
利用真空蒸鍍的方法，以上化合物為電洞傳輸與發光材料，Alq3或TPBI為電子傳輸材料，可製成系列電激發光元件。所有TPBI元件，光源係發自以上化合物，而Alq3元件中，光源可發自化合物(CBE33, CBH44, CBE44, CBE441)或Alq3 (CBH22, CBE22)。在Alq3發光的元件，化合物僅扮演電洞傳輸之角色。如在化合物與Alq3之間加入電洞阻擋材料BCP，則CBH22, CBE22構成的元件發光層也將由Alq3轉移至化合物。
與2,7雙苯胺取代的咔唑(carbazole)衍生物比較，本系列化合物的元件有較佳的效率。

New carbazole derivatives containing peripheral diarylamines at the 2- and 7-positions of the carbazole moiety have been synthesized via ring closure followed by palladium(0)-catalyzed C-N coupling reaction.
These new carbazole compounds (CBH22, CBE22, CBE33, CBH44, CBE44, CBE441) are amorphous with high glass transition temperatures (Tg , 111-196 oC) and high decomposition temperatures (Td > 334 oC). They are fluorescent and the colors of emission range from blue to green.
Two types of light-emitting diodes were constructed (I) ITO / Cpd / Alq3 / Mg : Ag and (II) ITO / Cpd / TPBI / Mg : Ag , where Alq3 and TPBI are tris(8-hydroxyquinoline) aluminum and 1,3,5-tris(N- phenylbenzimidazol-2-yl)benzene, respectively. Light emission occur in the compounds when TPBI is used as the electron-transporting layer. Light can emit from the compounds (CBE33, CBH44, CBE44, CBE441) or from Alq3 when is the electron-transporting layer. In the latter devices (for compounds CBH22, CBE22), the compounds function as the hole-transporting layer. If a layer of hole-blocking BCP is inserted between the compounds and Alq3, light emission can be confined in CBH22, CBE22.
The performance of the devices of these new compounds appears to be better than that of the devices fabricated from 3,6-diarylamine substituted carbazolyl analogues.

1. M. Pope, H. P. Kallmann, P. Magnante, J. Chem. Phys. 1963, 38, 2042.
2. C. W. Tang, S. A. VanSlyke, Appl. Phys. Lett. 1987, 51, 913.
3. C. W. Tang, S. A. VanSlyke, C. H. Chen, J. Appl. Phys. 1989, 65, 3610.
4. H. F. M. Schoo, 1998 Spring Meeting of Material Research Society, San Francisco, 1998.
5. E. P. Woo et al., 1998 Spring Meeting of Material Research Society, San Francisco, (1998).
6. J. H. Burroughes, D. D. C. Bradley, A. R. Brown, R. N. Marks, K. Mackey, R. H. Friend, P. L. Burns, A. B. Holmes, Nature, 1990, 347, 539.
7. T. Ishida, H. Kobayashi, Y. Nakato, J. Appl .Phys. 1993, 73, 4334
8. S. A. VanSlyke, C. H. Chen, C. W. Tang, Appl. Phys. Lett. 1996, 69, 2160.
9. Y. Shirota, Y. Kuwabara, H. Inada, Appl. Phys. Lett. 1994, 65, 807.
10. Y. Yang, A. J. Heeger, Appl. Phys. Lett. 1994, 64, 1245.
11. Y. Cao, G. Yu, C. Zhang, R. Menon, A. J. Heeger, Synth. Met. 1997, 87, 171.
12. Z. B. Deng, X. M. Ding, S. T. Lee, W. A. Gambling, Appl. Phys. Lett. 1999, 74, 2227.
13. A. Elschner, F. Bruder, H. W. Heuer, F. Jonas, A. Karbach, S. Kirchmeyer, S. Thurm, R. Wehrmann, Synth. Met. 2000, 111, 139.
14. T. M. Brown, J. S. Kim, R. H. Friend, F. Caciall, R. Daik, W. J. Feast, Appl. Phys. Lett. 1999, 75, 1679.
15. U. Mitschke, P. Bäuerle, J. Mater. Chem.2000, 10, 1471.
16. 陳金鑫, 石建民, 鄧青雲, 化學, 1996, 54, 125.
17. A. Kraft, A. C. Grimsdale, A. B. Holmes, Angew. Chem. Int .Ed. Engl. 1998, 37, 402
18. D. C. Freeman, C. E. White, J. Am. Chem. Soc. 1956, 78, 2678.
19. J. Kido, Phys. World, 1999, 12, 27.
20. C. Adachi, T. Tsutsui, S. Satio, Appl. Phys. Lett. 1989, 55, 1489
21. Y. Eamada, T. Sano, M. Fujita, T. Fujita, Y. Nishio, K. Shibata, Chem. Lett. 1993, 905.
22. N. Johansson, J. Salbeck, J. Bauer, F. Weissortel, P. Broms, A. Andersson, W. R. Salaneck, Adv. Mater. 1998, 10, 1136.
23. Y. T. Tao, E. Balasubramaniam, A. Danel, P. Tomasik, Appl. Phys. Lett. 2000, 77, 933.
24. J. F. Wang, Y. Kawabe, S. E. Shelaheen, M. M. Morell, G. E. Jabbour, P. A. Lee, J. Anderson, N. R. Armstrong, B. Kippelen, E. A. Mash, N. Peyghambarian, Adv. Mater. 1998, 10, 1136.
25. P. M. Borsenberger, W. Mey, A. Chowdry, Appl. Phys. Lett. 1978, 49, 273.
26. C. Hosokawa, T. Kusumoto, H. Higashi, US Patent, 1992, 5142343.
27. K. Imai, T. Wakimoto, Y. Shirota, H. Inada, T. Kobata, US Patent, 1994, 5374489.
28. T. Sano, T. Fuji, Y. Nishio, Y. Hamada, K. Shibata, K. Kuroki, Jpn. J. Appl. Phys. 1995, 34, 3124.
29. H. Mochizuki, T. Hasui, M. Kawamoto, T. Shiono, T. Ikeda, C. Adachi, Y. Taniguchi, Y. Shirota, Chem. Commun. 2000, 1923
30. K. R. Justin Thomas, J. T. Lin, Y-T Tao, J. Am. Chem. Soc. 2001, 123, 9404.
31. J. F. Hartwig, Angew. Chem. Int. Ed. Engl. 1998, 37, 2047.
32. J. F. Hartwig, Synlett 1997, 329
33. K. R. Justin Thomas, J. T. Lin, Y-T Tao, C.-W. Ko, Chem. Mater., 14, 3, 2002, 1354
34. J. L. Bredas, R. Silbey, D. S. Boudreaux, R. R. Chance, J. Am. Chem. Soc. 1983, 105, 6555.
35. S. Janietz, D. D. C. Bradley, M. Grell, C. Giebeler, M. Inbasekaran, E. P. Woo, Appl. Phys. Lett. 1998, 73, 2453.
36. Q.Wu, M.Esteghamatian, N.X.Hu, Z.Popovic, G.Enright, Y.Tao, M.Iorio, S.Wang, Chem.Mater.2000, 12, 79.
37. J. Guilford, W. R. Jackson, C.-Y. Choi, W. R. Bergark, J. Phys. Chem. 1985, 89, 294
38. Ullmann, F. Liebigs Ann. Chem. 1904, 332, 38
39. Ma, D.; Xia, C. Org. Lett. 2001, 3, 2583
40. J. F. Morin, M. Leclerc, Macromolecules 2001, 34, 4680.
41. G. Zotti, G. Schiavon, S. Zecchin, J.-F. Morin, M. Leclerc, Macromolecules 2002, 35, 2122.
42. T. Yamato, C. Hideshima, K. Suehiro, M. Tashiro, G. K. S. Prakash, G. A. Olah, J. Org. Chem. 1991, 56, 6248.
43. T. Yamamoto, M. Nishiyama, Y. Koie, Tetrahedron. Lett. 1998, 39, 2367.
44. J. F. Hartwig, S. Richards, D. Barahano, F. Paul, J. Am. Chem. Soc. 1996, 118, 3626.
45. P. Kundu, K. R. Justin Thomas, J. T. Lin, Y.-T. Tao, C.-H. Chien, Adv. Funct. Mater. 2003, 13, 6, 445
46. Emsley, J. Ed, The Elements, 3rd ed., Clarendon Press, Oxford: 1998, J. Emsley
47. L-Z. Zheng, C.-W. Chen, C-F. Lee, C.-C. Wu, T.-Y. Luh, Chem. Commun, 2002, 2336