摘要

在本篇論文我們將探討金和鋁與介電(SnSe〖、N〗_a3 AlF_6)薄膜的光學特性。首先會先介紹分析薄膜特性的方法:轉移矩陣法，再利用模擬軟體(MathCad、Sigmaplot)作圖。
第一部分為光子晶體的結構，第二部分為摻雜結構，不同結構我們都會比較其TE和TM波改變角度和改變厚度後的特性，其中TE波與入射角度有相聯關係，所以我們在比較不同厚度時，為了簡化其複雜性，都將入射角設定為0°，我們將可以發現隨著入射光角度加大能隙寬度和能隙寬度會往高頻區移動，在第二部分摻雜結構中可以發現能隙會有缺陷。

關鍵字: 光子晶體、光子能隙、缺陷結構

Abstract

In thesis, we shall study the properties of two dielectric(SnSe〖、N〗_a3 AlF_6) and gold, aluminum layers structures. First, we will discuss the method TMM, and then use Simulation software(MathCad、Sigmaplot) to get the result.
The first section is photonic structure, the second section is Defect structure, different structures we will compare their TE and TM waves to change the angle and the thickness of the characteristics, where the TE wave is associated with the incident angle, so we compare the different thickness, in order to simplify its complexity, the angle of incidence will be set to 0°.
We will be able to find that as the incident light angle increases the bandgap width and the energy gap width will move to the high frequency region, in the second section,we can found the photonic band gap have defect.

Keyword: photonic crystal, photonic band gap, defect structure

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