摘要
4-苯基二苯甲酮(PBP)在480nm~512nm波長範圍生命期為32μs的結構性磷光在苯溶劑中受到三乙胺，2-庚胺及十二烷胺的淬熄作用，在648nm處生成一個無結構性的激合體放射光譜其生命期分別為40μs,
53μs,46μs, 由淬熄作用的機制來看，其648nm處的放射峰可能由激發參重態(π,π*)3 和(n,π*)3的PBP與基態的三乙胺，2-庚胺及十二烷胺所形成

Abstract:
Structured phosophorescence with 32μs life time [480nm, 510nm(max),] from 4-phenyl-benzophenone(4-PBP) was quenched
by triethylamine (TEA) and2-heptylamine( 2-HPA),
dodecylamine(DDA) in benzene,respectively. An exciplex emission with strutureless 40μs,53μs,46μs life time peaking at 648nm. A quenching mechanism has been proposed to involve a mixed (π,π*)and (n,π*) triplet of 4- PBP to form an exciplex with the ground state of TEA , 2-HPA and DDA ,respectively.

參考文獻(References)
(1) Terenin, A. N;Ermolaev, V.L ,Trans.Faraday Dox., 52, 1042 (1952).
(2) Ermolaev, V. L. and Terenin, A.N ,Soviet Physics. Uspekhi.,3,423(1960); J.Chim.Phys.,55,698 (1958) .
(3) (a)Inokuli.M ,Hirayama.F, J.Chem.Phys., 42, 1978 (1965) .
(b)Birks, J.B.Wiley, Organic Molcular Photophysics., 517~545,(1975).
(c )Turro, N.J.,Molecular Photochemistry, chapter.Benjamini/Cummings, Menlo park.CA.(1978).
(4)(a)Gloss, G.L, Piotrowiak, P. MacInnis, J. M. Fleming, J. Am .Chem. Soc .,110, 2652 (1988) .
(b)Haggquist, G. W,katayama , H. Tsuchida , A. Ito, S. Yamamoto, M.J, J. Phys. Chem .,97, 9270 (1993) .
(c) Indig. G.C, Catalani , L. H. Wilson, J. Phys. Chem .,96,8967 (1992) .
(d)Kiyota, T. Yamaji , M.J and Shizuka H, J. Phys. Chem., 100, 672-679. (1996) .
(5)Saltiel, J.Choi, J-O;sears, D.F. Esker , D. W .O’Shea ,K.E and Qarcia , J.Am.Chem.Soc., 118, 7478~7485 (1996) .
(6)Jones, G II Photochemistry and Photophysic of Organic Charge Transfer Complexes”chapt17, pp245~304;”Photoinduced Electron Transfer “ed. By Fox, M.A and Chanon. M. (1988) .
(7)陳順基，方泰山，化學(中國化學會)(1997)第55卷，第四期，及其內的相關文獻
(8)Lewis, F. D. Acc, Chem.. Res ., 19,401-410 (1986) .
(9)Lewis, F. D. Reddy, G. D. Bassair, D. Schneider, S. Gahr. M, J. Am. Chem. Soc., 116, 597-605.(1994) .
(10)(a)Lewis, F. D. Ho, T.I, J. Am. Chem .Soc.,99. 7991-7996 (1977) .
(b)Lewis, F. D. Bassani, D.M. Burch, E.L. Cohen, B.E Engleman J, A’ eddy .D. Schneickr .S, Jaeger.W’Gedeck .P , J. Am .Chem Soc., 117,660-669.(1995) .
(11)(a)Mazzucato , U’ Momicchioli, Chem. Rev .,91 ,1679-1719 (1991) .
(b)Mazzucato, U. Pure. Appl. Chem., 54, 1705-1721 (1982)及其內參考資料
(12)Soltil, J’ Sears, D.F. Jr’ Choi,J-O;Sun, Y. D’ Eaker, D. W, J. Phys.Chem., 98, 35-46 (1994) 及內參考資料
(13)陳順基，(1997)”二苯乙及二苯甲衍生物的合成及其在凝相中之光物理”國立台灣師範大學碩士論文(1997年6月)，指導教授：方泰山
(14)Fumio Hirayama Radiological Physics Division, Argonne National Laboratory , Argonne, Illinois , J.Chem .Phy., 42,3163~3171(1965) .
(15):Frederich D. Lewis, G.Dasharatha Reddy, Dario M. Bassani, Siegfried Schneider, and Michael .Gahr , J.Am.Chem.Soc.,116, 597-605 (1994) .
(16)Frederick D.Lewis , Dario M. Bassani , Dric L.Burch, Bliss E. Cohen, Jeffrey A. Engleman, G. Dasharatha Reddy, Siegfride Schneider, Wighard Jaeger, Peter Gedeck,and Michaek Gahr, J.Am.Chem.Soc., 117, 2,(1995) .
(17) .Tsutomu Mimura and Michiya Itoh , J. Am. Chem. Soc., 1095~1099 (1976) .
(18) (a)S.P. Pappas,UV Curing Science and Technology. Technology Marketing Corporation, Stanford, CT, RSA. (1987) .
(b)C. G. Roffey, Photopolymerisation of Surface Coatings, Wiley, New York (1982).
(c) P.K.T Oldring(Ed), Chemistry and Technology of UV and EB Formulation of Coatings, Inks and Paints, SITA Technology , London, UK . , pp 1-6 (1991) .
(19)M. Marsman , A. Luiken, R.B.M. Holweg , Proceedings Conference Radtech Europe ., 440,(1991) .
(20) Journal of Photochemistry and Photobiology A:Chemistry ., 122 ,115-125 (1999) .
(21)Yasuhiko Shirota*, Kenji Okumoto , Hiroshi Inada ,Synthetic Metals .,111-112 ,387-391 (2000) .
(22)Baijun Chen, X.H.Zhang, X.Q.Lin, H.L.Kwong , N.B.Wong , C.S Lee,W.A. Gambling, S.T.Lee ,Synthetic Metal., 118,193-196 (2001) .
(23) Zhaobin Chen, Zhao Zhang, Xiaoying Yuan , Lisha Song, Fenglian Bai , Spectrochimica Acta Part A .,57 ,499-503, (2001) .
(24)Akio Kawai , Ryuji Kohno, Nobuhiro Oki, Kinichi Obi ,Chemical Physics Letters., 318 , 85-92 (2000) .
(25) Jack J. Chem, Adam Golebiowski, Joel McClenaghan, Sean R. Klopfenstein and Laura West ,Tetrahedraon Letters., 42, 2269-2271, (2001) .
(26)Toshihiro Nakayama*, Tetsuilo Nagahara,Sadao Miki, Kumao Hamanoue ,Journal of Photochemistry and Photobiology A:Chemistry .,133 ,11-20 (2000) .
(27)Eric Vauthey*, J. Phys. Chem. A.,104,1804-1810(2000) .
(28)Uwe Pischel, Xiangyang Zhang, Bruno Hellrung, Edwin Haselbach, Pierre-Alain Muller, and Wernwer M. Nar*, J. Am. Chem.Soc., 122, 2027-2034 (2000) .
(29)Sanjay Kumar, Sapan K.Jain, Neera Shrma, Ramesh C. Rastogi*
., Spectrochimica Acta Part A., 57 ,299-308 (2001) .
(30)J. P. Fouassier, J. Chim . Phys., 80, 339(1983) .
(31)P. J. Wagner, and I. Kochevar , J. Am. Chem. Soc.,90,2232(1969) .
(32)Jong Uk Kim a, Wanda K. Hartmann b, Harold J. Schock c , Brage Golding a, Daniel G. Nocera, Chemical Physics Letters., 267,323-328 (1997) .
(33)R.P.Wayne, “Principles and Applications of Photochemistry”, Oxford, New York. , 171(1988) .
(34)F. Wilkinson, G. P. Kelly, L. F. Ferreira, M. Isabel, Chem. Soc. Farans.,87(4) ,547 (1991) .
(35)T. S. Fang, J. Lin, S. Rudi, Ted, L. Asinger, Chem. Phys. Lett.,92(3), 283(1982).