先前的研究中我們以微波電漿化學氣相沈積系統(MPECVD)將奈米碳管直接成長在碳布上(CNTs-CC)，再以射頻磁控濺鍍機將白金觸媒佈植於奈米碳管上(Pt/CNTs-CC)，藉著奈米碳管的高導電性以及直接成長法降低介面阻值來增加白金觸媒的利用率，此外亦發現奈米碳管中摻雜氮厡子造就活性位置使得白金觸媒在奈米碳管上分散得更好，為了於奈米碳管上製造更多的活性官能基，我們在成長氣體中加入了氧氣，期望有更多的含氧官能基以及缺陷在奈米碳管表面生成。
在本研究中奈米碳管的成長氣體為CH4/H2/N2/O2流速為80/20/80/1.5 (sccm) ，在微波電漿化學氣相沈積系統中以1500 W的功率成長10分鐘，再以射頻磁控濺鍍機將白金觸媒佈植於直接成長含氧奈米碳管(Pt/O-CNT-electrode)以及一般奈米碳管上(Pt/CNT-electrode) ，並比較其電化學反應的差異。
我們以電化學方法、拉曼震動光譜、以及化學分析電子光譜得知碳管上含氧官能基的存在，並且發現Pt/O-CNT-electrode 在甲醇催化反應中遠比Pt/CNT-electrode 來的穩定，這是因為碳管表面含氧官能基的貢獻使得白金觸媒和碳材本身的作用力，加強本論文將分析此ㄧ材料的特性，並探究此材料對白金觸媒之催化活性以及穩定度方面貢獻的原因，期望能在往後的材料研究及應用面作出貢獻。

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