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研究生: 李奕成
Yi-Cheng Lee
論文名稱: 光子晶體的製備及鑑定
Fabrication and Characterization of Photonic Crystals
指導教授: 陳家俊
Chen, Chia-Chun
學位類別: 碩士
Master
系所名稱: 化學系
Department of Chemistry
論文出版年: 2002
畢業學年度: 90
語文別: 中文
論文頁數: 43
中文關鍵詞: 光子晶體
英文關鍵詞: photonic crystals
論文種類: 學術論文
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近年來,光子晶體的特殊光學性質已被廣泛研究及討論。在本篇論文中,我們利用電沉積的方式,成功地製作出三維高排列性多孔洞結構。我們將三種不同的半導體,硒化鉛、硫化鎘和砷化鎵,用電沉積的方式滲入蛋白石晶體之空隙,再用氫氟酸將二氧化矽膠體球溶蝕掉,即可得半導體高排列性多孔洞結構。而電沉積時所使用的電解液濃度、電沉積時間、溫度、電流大小以及電沉積所選用的溶劑,也將在論文中做詳細的探討。經由掃描式電子顯微鏡及X光能量散佈光譜儀,我們可以得知樣品的真實結構及其組成原子比例。再經由紫外光-近紅外光光譜儀測量樣品的光學性質,我們可以得知硫化鎘多孔洞結構在光譜上約1350奈米時有明顯的吸收峰。

Recently, there has been considerable interest in investigating the unique optical properties of three-dimensional photonic crystals, which consist of periodic dielectric structures with large index contrast. In this thesis, we used electrochemical deposition to fabricate 3D ordered macroporous structures. The films of three different semiconductors, PbSe, CdS, and GaAs, on the silica arrays were made using electrochemical depositions. Following by the removal of silica arrays, 3D macroporous structures made from those semiconductors have been obtained and these structures exhibited 3D periodicity and uniformity. Clear diffraction peaks at ~1350 nm of CdSe and CdS macroporous films were observed. The optical properties of the films will be discussed.

總目錄…………………………………………………………………Ⅰ 中文摘要………………………………………………………………Ⅲ 英文摘要………………………………………………………………Ⅳ 第一章 緒論…………………………………………………………1 1-1 引言………………………………………………………………1 1-2 光子晶體…………………………………………………………2 1-2-1 光能隙的基本性質…………………………………………2 1-2-2 蛋白石結構光子晶體………………………………………12 第二章 實驗……………………………………………………14 2-1 研究動機與目的………………………………………………14 2-2 蛋白石晶體的製作……………………………………………15 2-2-1 製作蛋白石晶體所需藥品…………………………………15 2-2-2 偵測儀器…………………………………………………15 2-2-3 製作蛋白石晶體…………………………………………15 2-3 高排列性多孔洞材料的製作…………………………………17 2-3-1 製作高排列性多孔洞材料所需藥品………………………17 2-3-2 製作高排列性多孔洞材料所需儀器………………………17 2-3-3 製作高排列性多孔洞材料………………………………17 第三章 結果與討論………………………………………………20 3-1 製作蛋白石晶體結構之實驗參數及其影響…………………20 3-2 蛋白石晶體的光學性質………………………………………25 3-3 製作高排列性多孔洞結構之實驗參數及其影響……………27 3-3-1 電解液濃度的控制…………………………………………27 3-3-2 電解液溫度及溶劑的探討…………………………………28 3-3-3 電流密度和電沉積時間的探討……………………………29 3-3-4 氫氟酸溶液的使用…………………………………………29 3-4 製作III-V族高排列性多孔洞結構之探討……………………34 3-5 三維高排列性多孔洞結構之光學性質………………………37 第四章 結論…………………………………………………………39 未來展望………………………………………………………………40 參考文獻………………………………………………………………41

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