以電鍍法製備Co/Cu多層膜，並分成四個部分討論基板、初始電鍍電位、緩衝液硼酸以及電鍍時間對Co/Cu多層膜磁性質的影響。主要藉由原子力顯微鏡(AFM)觀察其表面形貌以及粗糙度，柯爾磁光效應(MOKE)所得到的磁滯曲線判斷在外加磁場下磁矩的翻轉情形，以及利用磁阻(MR)變化率和圖形分析影響磁阻的機制並推測其多層膜內部的組成形式。最後一部分由XRD數據分析電鍍Co/Cu多層膜是否具有結構。

本實驗以定電位模式(銅:-0.4V，鈷:-0.9V)，硫酸系電鍍液沉積Co/Cu多層膜。
第一部分：討論基板(ITO/Cu和Si/Cu)以及第一層電鍍層(Co層和Cu層)對磁性質的影響。基板為ITO/Cu的導電層較厚且表面粗糙度比Si/Cu大，使其鍍率較高、MR變化率較低。而第一層電鍍層為Co層的樣品不論層數增加多少，均不影響其磁性質；第一層電鍍層為Cu的樣品隨著層數增加，粗糙度和矯頑場上升，但粗糙度增加至6nm後呈現穩定震盪的趨勢且矯頑場大幅下降，而MR變化主要來自巨磁阻(GMR)效應，隨多層膜層數增加而上升。
第二部分：電鍍液加入硼酸後，樣品表面顆粒明顯變小，對外加磁場的靈敏度增加，飽和磁場與矯頑場大幅下降，MR變化主要由GMRSPM效應貢獻。
第三部分：增加第一層電鍍Cu層的時間，大量消耗電極附近的Cu離子濃度，造成層狀結構不明顯，Cu層不連續，Co偏向以塊材形式生長，矯頑場與MR變化率不隨層數變化。
第四部分：從XRD數據討論電鍍Co單層與Co/Cu多層膜是否具有結構。Co(100)和Cu(100)的訊號峰幾乎重疊造成判斷不易，但可從MOKE量測發現微弱的四重對稱性。若Co層厚度增加，Co傾向排列成hcp的結構。

關鍵字：電鍍、磁阻、磁光效應、多層膜

[1]電鍍工藝配方設計、新技術應用實例與品質檢測標準規範使用手冊,安徽文化音像出版社
[2] Mosca DH, Petroff F, Fert A, Schroeder PA, Pratt Jr WP, Laloee R. J Magn. Magn. Mater 1991;94:L1–5.
[3] Parkin SSP, Bhadra R, Roche KP. Phys Rev Lett 1991;66:2152–5.
[4] Berkowitz AE, Mitchell JR, Carey MJ, Young AP, Zhang S, Spada FE, et al. Phys Rev Lett 1992;68:3745–8.
[5] M. Doughton, J. Magn. Magn. Mater. 192 (1999) 334.
[6] C.P.O. Treutler, Sens. Actuators A 9 (2001) 2.
[7] M. Suzuki, T. Ohwaki, Y. Taga, Thin Solid Films 304 (1997) 333.
[8] M.N. Baibich, J.M. Broto, A. Fert, F. Nguyen Van Dau, F. Petroff, P. Etienne, G.
Creuzet, A. Friederich, J. Chazelas, Phys. Rev. Lett. 61 (1988) 2472;
P. Grünberg, Acta Mater. 48 (2000) 239.
[9] R.L. White, IEEE Trans. Magn. 30 (1994) 346.
[10] I. Bakonyi , L. Péter, Progress in Materials Science 55 (2010) 107–245
[11] C.A. Ross, Annu. Rev. Mater. Sci. 24 (1994) 159.
[12] Á. Cziráki, J.G. Zheng, A. Michel, Zs. Czigány, G. Nabiyouni,W. Schwarzacher, E.Tóth-Kádár, I. Bakonyi, Z. Metallkd. 90 (1999) 278.
[13] L.H. Bennett, D.S. Lashmore, M.P. Dariel, M.J. Kaufman, M. Rubinstein, P. Lubitz,
O. Zadok, J. Yahalom, J. Magn. Magn. Mater. 67 (1987) 239 [Erratum, L.H.
Bennett, D.S. Lashmore, M.P. Dariel, M.J. Kaufman, M. Rubinstein, P. Lubitz, O.
Zadok, and J. Yahalom, J. Magn. Magn. Mater. 69 (1987) 116.].
[14] S. Roy, M. Matlosz, D. Landolt, J. Electrochem. Soc. 141 (1994) 1509;
S. Roy, D. Landolt, J. Electrochem. Soc. 142 (1995) 3021;
S. Roy, Surf. Coat. Technol. 105 (1998) 202;
S. Roy, Plat. Surf. Finish. 86 (4) (1999) 76.
[15] M. Alper,W. Schwarzacher, S.J. Lane, J. Electrochem. Soc. 144 (1997) 2346.
[16] W.R.A.Meuleman, S. Roy, L. Péter, I. Varga, J. Electrochem. Soc. 149 (2002) C479.
[17] Weihnacht V, Péter L, Tóth J, Pádár J, Kerner Zs, Schneider CM, et al. Giant
J Electrochem Soc 2003;150:C507–15.
[18] Bakonyi I, Péter L, Rolik Z, Kiss-Szabó K, Kupay Z, Tóth J, et al. Phys Rev B 2004;70:054427/1–10.
[19] Cziráki Á, Péter L, Weihnacht V, Tóth J, Simon E, Pádár J, et al. J Nanosci Nanotechnol 2006;6:2000–12.
[20] Péter L, Bakonyi I. Electrodeposition and properties of nanoscale magnetic/non-magnetic metallic multilayer films. In:Staikov G, editor. Electrocrystallization in nanotechnology. Weinheim (Germany): Wiley-VCH; 2007. p. 242–60 [chapter 12].
[21] Subir Kumar Ghosh, Electrochimica Acta 53 (2008) 8070–8077
[22] P. Weiss, Compt. Rend. 143 (1906) p.1136-1139
[23] INTRODUCTION TO MAGNETIC MATERIALS, B. D. CULLITY,C. D. GRAHAM p.126,117
[24] 磁性基本特性及磁性材料應用,杜怡君,國立台灣大學化學系
[25] M.N. Baibich, J.M Broto, A.Fert et al.,Phys. Rev. Lett. Vol. 61, p2472-2475 (1988)
[26] G. Binasch, P. Grünberg, F. Saurenbach, and W. Zinn, Phys. Rev. B, vol. 39,No.7 (1989)
[27] Mott NF. The electrical conductivity of transition metals. Proc Roy Soc (London) A1936;153:699–717;Mott NF. The resistance and thermoelectric properties of the transition metals. Proc Roy Soc (London) A1936;156:368–82.
Mott NF. Electrons in transition metals. Adv Phys 1964;13:325–422.
[28]陳文娟,國立成功大學物理研究所碩士論文(2002)
[29] A.E. Berkowitz et al., Phys. Rev. Lett. 68, 3745(1992)
[30]C. L. Chien, F. Y. Yang, Kai Liu, D. H. Reich, P. C. Searaon, J. Appl. Phys. 87, 4659(2000)
[31] Gittleman JL, Goldstein Y, Bozowski S. Magnetic properties of granular nickel films. Phys Rev B 1972;5:3609–21.
[32] 聶向富,馬麗梅,郭革新,孫會元,唐貴德,河北科技大學學報,Vol. 24, No. 2(2003)
[33] M. Julliere Phys. Lett. A Vol. 54, Issue 3(1975), Pages 225–226
[34] John G. Simmons, J. Appl. Phys. 34, 1793 (1963)
[35] R. von Helmolt, J. Wecker, B. Holzapfel, L. Schultz, and K. Samwer , Phys. Rev. Lett. 71, 2331–2333 (1993)
[36] Jonker, G. H., and Van Santen, J. H., Physica 16, 337 (1950)
[37] Z.Q Qiua, S.D Baderb, J. Magn. Magn. Mater. 200 (1999) 664-678.
[38] E.R. Moog, S.D. Bader, Superlattices Microstruct. 1, 543 (1985).
[39] Carlson, B. E., and U. S. Inan (2008), A novel technique for remote sensing of thunderstorm electric fields via the Kerr effect and sky polarization, J. Geophys. Res., 35,
[40] 胡啟章,電化學原理與方法,五南書局
[41] 電鍍手冊(1989),國防工業出版社
[42] ELECTROCHEMICAL METHODS( Fundamentals and Applications), Allen J. Bard
Larry R. Faulkner
[43] Keith B. Oldham, Journal of Electroanalytical Chemistry 613 (2008) 131–138
[44] 吳在冉等,電化學基礎Ⅲ-雙電層模型及其發展,儲能科學與技術Vol.2 No.2(2013)
[45] J.E. Ayers, “Heteroepitaxy of semiconductors : theory, growth, and characterization”(2007), p.105-137, p.161-170
[46] G. Springholz, N. Frank, G. Bauer, Thin Solid Films Vol.15 P.15–23(1995)
[47] 羅吉宗,”薄膜科技與應用”, 全華科技圖書股份有限公司出版(2005)
[48] Scott A. Chambers, Surface Science Report, 39, 105(2000)
[49]原子力顯微鏡,吳坤憲, Southern Taiwan University of Technology
[50] Péter L, Bakonyi I. Electrodeposition and properties of nanoscale magnetic/non-magnetic metallic multilayer films. In:Staikov G, editor. Electrocrystallization in nanotechnology. Weinheim (Germany): Wiley-VCH; 2007. p. 242–60 [chapter 12].
[51] Oznur Karaagac, MurselAlper, HakanKockar, J. Magn. Magn. Materi 322 (2010) 1098–1101
[52] T.M. Manhabosco, I.L. Müller, Surf. Coat. Technol. Vol. 202, (2008) Pages 3585–3590
[53]Chen-Bin Wang, Chia-Chan Lee, Jia-Lin Bi, Jia-Yi Siang, Jyong-Yue Liu, Chuin-Tih Yeh, Catalysis Today Vol.146, Issues 1–2,(2009), Pages 76–81
[54] Yu Liu, David Edouard, Lâm D. Nguyenb, Dominique Begina, Patrick Nguyenc, Charlotte Phamc, Cuong Pham-Huu, Chemical Engineering Journal Vol. 222(2013), Pages 265–273