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研究生: 廖庭維
Ting-Wei Liao
論文名稱: 矽量子點光檢測器之研究
Studies of Silicon Quantum Dots Photodetectors
指導教授: 胡淑芬
Hu, Shu-Fen
學位類別: 碩士
Master
系所名稱: 光電工程研究所
Graduate Institute of Electro-Optical Engineering
論文出版年: 2008
畢業學年度: 96
語文別: 中文
論文頁數: 91
中文關鍵詞: 矽量子點光檢測器
英文關鍵詞: Silicon Quantum Dots, Photodetectors
論文種類: 學術論文
相關次數: 點閱:140下載:5
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  • 在本篇論文中,提供一種具多重奈米量子點檢測光子之光電子元件,藉由“重複堆疊結構”形成矽量子點與穿透接面,做為光檢測器之檢測構件,進而製作出矽量子點光檢測器。
    在光檢測之實驗中,將針對奈米級光檢測器元件結構做光電效應特性之量測,利用不同波長之光源照射至矽量子點,藉由矽量子點扮演光轉換為電之主要角色,量測結果顯示,此元件吸收光源進而產生光電流之轉換效率非常高,具有高敏感與非常靈敏之光切換特性,並且元件本身之雜訊與暗電流特性都非常低。另外,經過長時間之光檢測實驗測量之後,其光電效應之特性也不會改變。元件在不同波長(300 nm ~ 1000 nm)之光源照射下,所得量子效率與光響應度非常高。因此,針對量測結果,進一步分析元件中光子與電子間主要之交互作用,即探討半導體矽量子點光檢測器之主要工作原理與其影響。

    In this study, we fabricated a nano device formed by plurality of artificial quantum dots and tunneled junctions, which served as a detection element of photodetector.
    In the experiments, the characteristic analysis of the photoelectric effect of optoelectronic devices, when it is play a main role in silicon quantum of the photodetector, which can transform an optic signal to an electric signal, and illuminate the light source of different wavelength, Experiment in the light examination, will aim at the detector part structure to make gauging the photoelectric effect characteristic. Silicon quantum dots play the main role of transform an optic signal to an electric signal by different wave length of illumination. The gauging results demonstrated, the device absorbed photo-energy then transfer the energy to high efficiency photoelectric current. Our device has stable and high sensitively, fast switches over the characteristic, and the device noise and dark current characteristic are all very low. Moreover, after passes through light of examination experiment the long time surveys, characteristic of its photoelectric effect cannot change. Under the different wave length (300 nm ~ 1000 nm) illumination, the obtained quantum efficiency and light responsiveness is extremely high. Therefore, in view of the gauging result, further analyzes in the part between the photon and the electron the main correlation, if namely discusses the semiconductor vs. quantum light detector the prime task principle to affect.

    目錄………………………………………………………………I 表目錄……………………………………………………………IV 圖目錄……………………………………………………………V 序 章 論文結構介紹……………………………………………1 第一章 簡介(Introduction…………………………………2 1.1 矽基(Si-based)於光電元件之發展沿革………………4 1.2 奈米科技……………………………………………………5 1.2.1奈米材料之簡介……………………………………………5 1.2.2 奈米材料分類與特性……………………………………7 1.2.3 零維奈米材料之簡介……………………………………10 1.2.4 奈米材料之應用…………………………………………11 1.3 本研究之動機………………………………………………12 1.4 本研究之目的………………………………………………13 第二章 原理(Principle)……………………………………14 2.1 光檢測器之工作原理………………………………………15 2.2 光子與電子之間之基本交互作用…………………………16 2.2.1 輻射轉換……………………………………………16 2.2.2 光的吸收……………………………………………18 2.3 光檢測器之電流機制………………………………………19 2.3.1 光電流(photo current)……………………19 2.3.2暗電流(dark current)…………………………21 2.3.3雜訊電流(noise current)……………………22 2.4 量子效率(quantum efficiency)與光響應度(Responsivity)…22 2.5 奈米尺寸之量子效應…………………………………………23 2.5.1量子侷限效應(Quantum Confinement Effect , QCE)…23 2.5.2能帶結構之改變(間接能隙改變為直接能隙)…………25 第三章 製程 ( process )…………………………………………27 3.1 元件結構與光罩設計……………………………………………27 3.1.1元件結構設計…………………………………………………27 3.1.2光罩佈局與設計………………………………………………31 3.2 元件製作步驟……………………………………………………37 3.2.1元件第一道步驟…………………………………………37 3.2.2元件第二道步驟…………………………………………38 3.2.3元件第三道步驟…………………………………………39 3.2.4元件第四道步驟…………………………………………39 3.2.5元件第五道步驟…………………………………………39 3.3 製程原理…………………………………………………………41 3.3.1晶圓清洗製程……………………………………………41 3.3.2氧化以及熱處理製程……………………………………43 3.3.3沉積製程…………………………………………………44 3.3.4微影製程…………………………………………………46 3.3.5蝕刻製程…………………………………………………50 3.3.6 SEM 規格設備…………………………………………53 第四章 量測與分析(Measurement and Analysis)……………55 4.1量測儀器之架設……………………………………………………55 4.1.1使用之設備儀器……………………………………………55 4.1.2光電效應等特性之量測步驟與方法………………………57 4.1.3光電效應等特性之電性量測儀器設定……………………58 4.2 量測結果與分析……………………………………………………61 4.3 理論計算……………………………………………………………71 第五章 結果與討論(Result and Discussion)…………………74 5.1結論…………………………………………………………………74 5.2 未來工作……………………………………………………………76 參考文獻……………………………………………………………………77

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