本研究主要在於探討銦錫氧化物之光電特性，進而應用至矽奈米柱太陽能電池之上電極，電極主要功用為收集載子，因太陽能電池本身為吸收光並將光轉換為電之元件，因此其電極必須具備透光度極高特性，而電極本身導電度品質亦會影響到收集載子之效率，故高導電特性電極亦為必要條件。本研究之銦錫氧化物採用射頻磁控濺鍍法製作，經由一系列鍍膜參數探討出最佳鍍膜條件，再經由真空退火法尋I求最佳退火溫度與時間。基板溫度300℃濺鍍出之銦錫氧化物經過500℃、20分鐘真空退火後，於可見光區300 nm至700 nm波段之平均穿透率可高達90% 以上，而片電阻亦可低於10Ω/□。X-ray繞射分析部分，繞射峰包含(221)、(222)、(400)、(440)與(662)，且可發現隨退火溫度上升，(222)繞射強度有漸增趨勢，其薄膜結晶性更佳，而薄膜表面粗糙度亦可低於2 nm。
　　銦錫氧化物應用於太陽能電池上電極，對於矽奈米柱直徑為400 nm之p+-i-n結構太陽能電池而言，整體光電流密度從4.47 mA/cm2提升至27.6 mA/cm2，光轉電效率從0.45% 提升至4.73%，此乃透明導電層大幅縮短了載子行走距離，使電極之載子收集效率提升而導致光電流大幅增加，光轉電效率亦上升十倍之多。

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