本論文主要探討如何利用全像蝕刻(Holographic lithography)技術來設計並製作二維及三維光子晶體(photonic crystal)之結構。首先利用電腦模擬計算三道及四道平面光波相交干涉的光強度分佈，並探討光束間之夾角、光波波長、入射光強度比及材料折射率等系統參數對二維或三維光子晶體晶格週期及結構的影響。根據理論分析的結果，我們建立全像干涉系統，以實驗驗證理論的模擬與分析，實際製作出光子晶體的結構；在二維光子晶體方面，我們利用三道光束對稱入射，製作出蜂巢結構的二維光子晶體，並將此結構應用在綠光發光二極體上，且成功地增加約一倍的發光效率；在三維光子晶體方面，我們利用四道光束相交干涉，在光阻上製作出面心立方結構的三維光子晶體，其實驗結果之晶格週期約為8μm及1.5μm左右。

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