簡易檢索 / 詳目顯示

研究生: 楊智仲
Chih-Chung Yang
論文名稱: 厚膜光阻製程應用於靜電驅動旋轉式微致動器之研製
Fabrication of the electrostatic micro rotational actuator by thick photoresist process
指導教授: 楊啓榮
Yang, Chii-Rong
學位類別: 碩士
Master
系所名稱: 機電工程學系
Department of Mechatronic Engineering
論文出版年: 2004
畢業學年度: 92
語文別: 中文
論文頁數: 109
中文關鍵詞: SU-8厚膜光阻蝕刻釋放技術連桿驅動機構靜電式微致動器
英文關鍵詞: SU-8 thick resist, etch release technique, linkage-drive mechanism, electrostatic actuator
論文種類: 學術論文
相關次數: 點閱:335下載:37
分享至:
查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報
  • SU-8厚膜光阻利用一般的微影製程,即可製作高深寬比的微結構。目前SU-8光阻主要是應用於LIGA電鑄製程之模板、熱壓成形之模仁、微光合成形、光波導、微流體應用流道或微機械結構等之材料,在直接將SU-8光阻作為微致動器結構材料的研究並不多見。本研究目的即是結合低成本的SU-8厚膜光阻製程與矽蝕刻釋放技術,開發一體成型之靜電式微致動器。利用SU-8厚膜光阻容易微影成形,及材質強度與熱穩定佳之特性,將其直接作為靜電式微連桿驅動機構的本體材料,不用電鑄程序翻製成金屬結構,可避免SU-8光阻去除性不佳的困擾。以SU-8光阻作為微致動器材料,其驅動反應速率將可大於金屬結構微致動器,減少驅動輸入功率的消耗。全SU-8厚膜光阻的製程與微結構,其優點為低成本、可降低微致動器因組裝所造成的誤差,利用間接驅動方式增加致動器的作動行程。製作完成之靜電式致動器,經局部結構釋放且鍍金屬膜後,成功地以直流150伏特電壓驅動。

    The research has developed the electrostatic micromechanism-drive actuator through the combination of low-cost SU-8 thick resist process and etch release technique. The SU-8 thick resist process can be used to fabricate the high aspect ratio microstructures that can add the strength and the electrical properties of microdevices. Moreover, the SU-8 resist is used as the body material of micromechanism; this can directly avoid the stripped difficulty and inconvenient assembly like MUMPs process. Besides, the microactuator fabricated by SU-8 can make the driving response larger than the one fabricated by metal. We have finished electrostatic actuator that was all in one not assembled. Advantages of electrostatic actuator are low cost, decrease microstructures assembled tolerances and increase active range of micromechanism by being driven indirectly. In our study, Electrostatic actuators that was sputtered metal, are driven by DC 150 V.

    摘要 Ⅰ 總目錄 Ⅲ 圖目錄 Ⅴ 表目錄 Ⅹ 第一章 緒論 1 1.1 研究動機 1 1.2 SU-8厚膜光阻 5 1.3 論文架構 10 第二章 文獻回顧 11 2.1 SU-8厚膜光阻於微機電領域之應用 11 2.1.1 製程特性之研究 11 2.1.2 SU-8厚膜光阻之應用研究 13 2.2 靜電式微致動器 29 第三章 微致動器之設計與製程規劃 37 3.1 靜電式微致動器之設計 37 3.1.1 元件結構設計 37 3.2 靜電式微致動器之製程規劃 44 3.2.1 製程規劃 44 3.2.2 電性驅動測試 46 3.3 實驗設備 51 第四章 實驗結果與討論 58 4.1 厚膜光阻製程 58 4.1.1 初始光罩尺寸之製作結果討論 58 4.1.2 新光罩尺寸之製作結果討論 86 4.2 電性驅動測試 101 第五章 結論 103 參考文獻 106

    1. 楊啟榮 等人, "微機電系統技術與應用", 精密儀器發展中心, 第四章, p. 142 (2003).
    2. 鐘震桂、盧慧娟、趙天行, "感應耦合電漿的矽非均向蝕刻技術", 第三屆奈米工程暨微系統技術研討會, pp. 83-87 (1999).
    3. E. C. Harvey, P. T. Rumsby, M. C. Gower and J. L. Remnant, "Microstructuring by excimer laser", SPIE 2639, pp. 266-277 (1995).
    4. H. Lorenz, M. Despont, P. Vettiger and P. Renaud, "Fabrication of photoplastic high-aspect ratio microparts and micromoldsusing SU-8 UV resist", Microsystem Technologies, Vol. 4, pp. 143-146 (1998).
    5. http://www.microchem.com/products/su_eight.htm
    6. 楊啟榮, "SU-8厚膜光阻於微系統UV-LIGA製程的應用", 科儀新知 21(5), p. 46 (1998).
    7. C. G. Willson, H. Ito, M. J. Frechet and F. Houlihan, "Chemical amplification in the design of polymers for resist application", Pure and applied chemicstry, pp. 207-219 (1982).
    8. D. W. Johnson, "MCC Technical Report", Advance Package Seminar (1998).
    9. M. Shaw, D. Nawrocki, R. Hurditch, D. Johson, "Improving the process capability of SU-8", Microsystem Technologies, Vol. 10, pp. 01-06 (2003).
    10. M. Despont, H. Lorenz, N. Fahrni, J. Bruger, P. Renaud and P. Vettiger, "High -aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS application", Proceeding of IEEE Micro Electro Mechanical Systems , pp.518-522 (1997).
    11. H. Lorenz, M. Despont, N. Fahrni, J. Brugger, P. Vettiger and P. Renaud, "High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS", Sensors and Actuators A, Vol. 64, pp. 33-39 (1998).
    12. G. Bleidiessel, G. Gruetzner, F. Reuther, S. Fehlberg, B. loechel and A. Maciossek, "Dependence of the quality of thick resist structures on resist baking", Microelectronic engineering, Vol. 41-42, pp. 433-436 (1998).
    13. B. Loechel, "Thick-layer resists for surface micromachining", Journal of Micromech. Microeng., Vol. 10, pp. 108-115 (2000).
    14. M. Kubenz, U. Ostrzinski, F. Reeuther, G. Gruetzner, "Effective baking of thick and ultra-thick photoresist layers by infrared radiation", Microelectronic engineering, Vol. 67-68, pp. 495-501 (2003).
    15. P. M. Dentinger, W. M. Clift and S. H. Goods, "Removal of SU-8 photoresist for thick film applications", Microelectronic engineering, Vol. 61-62, pp. 993-1000 (2002).
    16. C.-H. Ho and W. Hsu, "Experimental investigation of an embedded root method for stripping SU-8 photoresist in the UV-LIGA process", Journal of Micromech. Microeng., Vol. 14, pp. 356-364 (2004).
    17. 莊昀儒, "微型高分子材料單石熱汽泡式微液滴產生系統之研發", 國立清華大學工程與系統科學系, 博士論文, pp. 136-137 (2003).
    18. K. Y. Lee, N. LaBianca, S. A. Rishton, S. Zolgharnain, J. D. Gelorme, J. Shaw and T. H.-P. Chang, "Micromachining applications of a high resolution ultrathick photoresist", Journal of vacuum science and technology B, Vol. 13, pp. 3012-3016 (1995).
    19. J. Zhang, K. L. Tan, G. D. Hong, L. J. Yang and H. Q. Gong, "Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS", Journal of Micromech. Microeng., Vol. 11, pp. 20-26 (2001).
    20. R. J. Jackman, T. M. Floyd, R. Ghodssi, M. A Schmidt and K. F. Jensen, "Microfluidic systems with on-line UV detection fabricated in photodefinable epoxy", Journal of Micromech. Microeng., Vol. 11, pp. 263-269 (2001).
    21. S. Li, Carl B. Freidhoff, R. M. Young and R. Ghodssi, "Fabrication of micronozzles using low-temperature wafer-level bonding with SU-8", Journal of Micromech. Microeng., Vol. 13, pp. 732-738 (2003).
    22. F.-G. Tseng and C.-J. Lin, "A high sensitive Fabry-Perot shear stress sensor employing flexible membrane and double SU-8 structures", Proceedings of IEEE Sensors , Vol. 2, pp. 969-972 (2002).
    23. J. Thaysen, A. D. Yalcinkaya, P. Vettiger and A. Menon, "Polymer-based stress sensor with integrated readout", Journal of Physics D: Applied Physics, Vol. 35, pp. 2698-2703 (2002).
    24. S. Btefisch, V. Seidemann and S. Bttgenbach, "Novel micro-pneumatic actuator for MEMS", Sensors and Actuators A, Vol. 97-98, pp. 638-645 (2002).
    25. I. Roch, P. Bidaud, D. Collard and L. Buchaillot, "Fabrication and characterization of an SU-8 gripper actuated by a shape memory alloy thin film", Journal of Micromech. Microeng., Vol. 13, pp. 330-336 (2003).
    26. G. Genolet, M. Despont, P. Vettiger, D. Anselmetti, N. F. de Rooij, "All-photoplastic, soft cantilever cassette probe for scanning force microscopy", Journal of vacuum science and technology B, Vol. 18, pp. 617-620 (2000).
    27. Y.-K. Yoon, J.-H. Park, F. Cros and M. G. Allen, "Integrated vertical screen mcirofilter system using inclined SU-8 structure", Micro Electro Mechanical System IEEE The Sixteenth Annual International Conference on, pp. 227-230 (2003).
    28. H. Fujita, "Micromechanical system", The third Toyota conference, pp. 279-295 (1989).
    29. H. C. Nathanson, W. E. Newell, R. A. Wickstrom, and J. R. Davis, "The Resonant Gate Transistor", IEEE Trans. on Electron Devices, Vol ED-14, pp. 117-133 (1967).
    30. N. Tirole, D. Hauden, P. Blind, M. Froelicher and L. Gaudriot, "Three-dimensional silicon electrostatic linear microactuator", Sensors and Actuators A, Vol. 48, pp. 145-150 (1995).
    31. R. Yeh, S. Hollar and K. S. J. Pister, "Single mask, Large force and large displacement electrostatic linear inchworm motors", IEEE International Conference on the Micro Electro Mechanical System, pp. 260-264 (2001).
    32. J. Branebjerg and P. Gravesen, "A new electrostatic actuator providing improved stroke length and force", IEEE Micro Electro Mechanical Systems, pp. 6-11 (1992).
    33. R. Legtenberg, J. Gilbert, S. D. Senturia and M. Elwenspoek, "Electrostatic curved electrode actuators", Journal of microelectromechanical systems, pp. 257-265 (1997).
    34. F. Sherman, S. Tung, C.-J. Kim, C.-M. Ho and J. Woo, "Flow control by using high-aspect-ratio, in-plane microactuators", Sensors and Actuators A, Vol. 73, pp. 169-175 (1999).
    35. J. T. Ravnkilde, K. P. Larsen and H. Henningsen, "Fabrication of nickel microshutter arrays for spatial light modulation", Proceedings of the 4th meso mechanics conference, pp.1-5 (2002).
    36. W. S. N. Trimmer and K. J. Gabriel, "Design considerations for a practical electrostatic micromotor", Sensors and Actuators A, Vol. 11, pp. 189-206 (1987).
    37. 趙俊傑, "類LIGA製程應用於靜電式微致動器光開關之研製", 國立臺灣師範大學工業教育學系, 碩士論文, pp. 88-94 (2003).
    38. R. Feng and R. J. Farris, "Influence of processing conditions on the thermal and mechanical properties of SU8 negative photoresist coatings", Journal of Micromech. Microeng., Vol.13, pp. 80-88 (2003).

    QR CODE