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研究生: 密修誌
論文名稱: 脈衝雷射蒸鍍法製備氧化釓鋅薄膜的探討: 結構、光學與磁性研究
Study of Zinc Gadolinium Oxide Thin Flims Grown by Pulsed-Laser Deposition: Structural, Optical, and Magnetic Properties
指導教授: 駱芳鈺
學位類別: 碩士
Master
系所名稱: 物理學系
Department of Physics
論文出版年: 2013
畢業學年度: 101
語文別: 中文
論文頁數: 34
中文關鍵詞: 稀磁半導體氧化鋅室溫鐵磁性
英文關鍵詞: DMS, ZnO, Gd, hysteresis loop
論文種類: 學術論文
相關次數: 點閱:109下載:2
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  • 我們是利用脈衝雷射沉積法製備摻雜釓的氧化鋅薄膜,X光繞射顯示樣品維持原有的晶體結構,但c軸晶格常數減小。因為薄膜的厚度在300nm以下,所以拉曼散射光譜只獲得微弱的訊號,樣品的能隙發光強度隨著摻雜濃度上升而下降,缺陷發光則隨釓濃度上升而增加,主要的缺陷有鋅錯位及鋅間隙,所有的樣品僅有Zn0.95Gd0.05O在室溫具有鐵磁性,其餘皆為順磁性。室溫(300K)的m-H曲線,只有x=0.051有磁滯曲線,在氧壓為3×10-1mbar及這樣的濃度下室溫是有鐵磁性。

    In this thesis, Gadolinium (Gd)-doped ZnO (Zn1-xGdxO) thin films were grown on c-sapphire by pulsed-laser deposition. The nominal Gd concentration is between 0% and 20%. The XRD patterns show that there is no secondary phase, and c-lattice constant decreases with increasing Gd density. Only one weak ZnO oscillation mode was observed from Raman spectroscopy because the thickness of the thin films is sm-aller than 300nm. Photoluminescence spectroscopy at different temperatures showed a slight decrease in band gap and increase in defect emissions as Gd concentration increases. The major defects are zinc vacancy and interstitial zinc. The room temperature m-H curves show that there is only hysteresis loop for 5.1% Gd, the rest show only paramagnetism.

    Chapter1∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙1 Chapter 2 背景知識∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙4 2.1氧化鋅(ZnO)、釓(Gd)與藍寶石基板(Sapphire)性質∙∙∙∙∙∙∙∙∙∙∙4 2.2脈衝雷射蒸鍍法(Pulsed Laser Deposition, PLD)∙∙∙∙∙∙∙∙∙∙∙5 2.2.1原理∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙5 2.2.2不同氧壓氧化鋅電漿團∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙7 2.2.2 PLD鍍膜系統∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙7 2.3 X光繞射(X-Ray Diffraction) ∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙8 2.3.1 X光原理∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙8 2.3.2布拉格繞射∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙9 2.4光致螢光(Photoluminescence, PL)∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙11 2.4.1基本原理∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙11 2.4.2實驗過程∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙13 2.5拉曼光譜(Raman spectroscopy) ∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙14 2.6 X射線螢光光譜分析(EDXRF) ∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙15 2.7超導量子干涉儀(SQUID)與磁性簡介∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙16 2.7.1超導量子干涉儀(SQUID)簡介∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙16 2.7.2磁性簡介∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙17 Chapter 3實驗過程∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙19 3.1鍍膜條件∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙19 3.2靶材製作∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙20 3.3藍寶石(c-sapphire)基板清洗∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙20 3.4鍍膜步驟∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙20 Chapter 4 結果與討論∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙21 4.1氧化鋅薄膜的結構及光學特性Zn1-xGdxO(x=0∙∙∙∙∙∙21 4.2固定氧壓3×10-1mbar摻雜不同濃度釓元素成份分析(EDXRF) ∙∙∙∙∙23 4.3 固定氧壓3×10-1mbar摻雜不同濃度釓元素比較∙∙∙∙∙∙∙∙∙∙∙25 4.3.1 不同濃度釓元素比∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙25 4.3.2 Zn1-xGdxO x=0.021與0.051 氧壓3×10-1mbar PL譜線分∙∙27 4.4拉曼光譜分析∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙28 4.5 磁性分析∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙30 Chapter 5 結果討論與未來展望∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙∙31

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