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研究生: 周明寬
論文名稱: 鐵在鍺(111)-c(2×8)及銀/鍺(111)-(√3×√3) 表面上隨溫度衍化的行為
Thermal evolution of Iron on Ge(111)-c(2×8) and Ag/Ge(111)-(√3×√3) surfaces
指導教授: 傅祖怡
學位類別: 碩士
Master
系所名稱: 物理學系
Department of Physics
論文出版年: 2012
畢業學年度: 101
語文別: 中文
論文頁數: 113
中文關鍵詞: 掃描穿隧顯微鏡半導體
英文關鍵詞: STM, semiconductor, Ge, Fe
論文種類: 學術論文
相關次數: 點閱:155下載:19
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  • 在室溫下蒸鍍少量鐵原子於鍺(111)-c(2×8)上,並進行一連串加熱退火的實驗,以穿隧掃描顯微鏡對其形貌進行觀測。從STM的影像圖和對表面上原子島的體積分析,顯示隨著加熱退火溫度的提升,鐵會在鍺基底上造成缺陷與破洞,藉以拉出鍺進行合金使體積增加,並形成數種不同形貌的島嶼。最終當加熱退火溫度達到840K以上後,表面上的原子團會聚集成數種巨大的原子島。
    再來將銀蒸鍍至鍺(111)-c(2×8)表面上,將其加熱退火使樣品表面重構為銀/鍺(111)-(√3×√3)後,蒸鍍少量鐵再度進行加熱退火的實驗。與鐵鍺系統的實驗結果比較後發現,銀能夠保護基底上不會出現缺陷,但仍無法阻止鐵在加熱退火溫度升高後從基底拉出鍺進行合金。於鐵銀鍺系統中發現的原子島種類和鐵鍺系統中大致相同,但鐵銀鍺系統中出現新種類的島和一些跡象顯示銀對於鐵鍺合金的成長仍有影響力。

    By scanning tunneling microscope, the Ge(111)-c(2×8) substrate which deposited less than one monolayer Iron atoms in room temperature, and its thermal evolution by annealing to different temperature was investigated. As the annealing temperature rises, iron will cause many defects and holes on the substrate to pull out germanium. Then they mix and form some kinds of alloy islands, this makes the total volume of islands above the surface increase. After annealing temperature above 840K, only few giant Fe-Ge alloys islands remain on the surface.
    In the different experiment, we deposit Fe on Ag/Ge(111)-(√3×√3) and observe the thermal evolution. The results show that silver as the buffer layer can protect the (√3×√3) reconstruction suffering from defects, but can't prevent Iron digging on substrate and alloying with germanium when annealing temperature rises. The kinds of island in FeGe and FeAgGe system are similar, but few difference show that silver still have some effect on the development of islands.

    摘要 i Abstract ii 目錄 iii 第一章 緒論 1 第二章 實驗原理與方法 4 2.1 STM基本原理 4 2.1.1 穿隧效應 4 2.1.2 侷域電子態密度 7 2.2 STM操作原理 8 2.2.1 定電流模式 9 2.2.2 定高度模式 10 2.3 LEED的基本原理 11 第三章 實驗儀器 13 3.1 實驗儀器簡介 13 3.2 超高真空系統 14 3.2.1 油封式機械幫浦 14 3.2.2 渦輪分子幫浦 15 3.2.3 離子幫浦 16 3.2.4 鈦昇華幫浦 18 3.3 真空壓力計 19 3.3.1 派藍尼真空計 19 3.3.2 離子真空計 20 3.4 殘氣分析儀 21 3.5 離子濺射鎗 23 3.6 蒸鍍系統 24 3.6.1 電子束蒸鍍鎗 24 3.6.2 K-cell蒸鍍鎗 25 3.7 低能量電子繞射儀 26 3.8 掃描式穿隧電子顯微鏡 28 3.8.1 掃描頭 29 3.8.2 步進器 29 3.8.3 避震裝置 30 3.8.4 電子控制系統 30 第四章 實驗步驟 31 4.1 實驗流程圖 31 4.2 前置作業 32 4.2.1 製備STM探針 32 4.2.2 樣品準備 34 4.3 超高真空環境的建立 36 4.4 基底的選擇與處理 38 4.4.1 鍺(111)-c(2×8)重構 38 4.4.2 銀/鍺(111)-(√3×√3)重構 39 4.5 STM影像處理 40 第五章 實驗數據與討論 41 5.1 0.2ML鐵在鍺(111)-c(2×8)表面上的成長 41 5.1.1 室溫下蒸鍍0.2ML的鐵至鍺(111)-c(2×8)表面 42 5.1.2 加熱退火至400K 43 5.1.3 加熱退火至500K 44 5.1.4 加熱退火至570K 45 5.1.5 加熱退火至640K 46 5.1.6 加熱退火至740K 47 5.1.7 加熱退火至830K 48 5.2 0.6ML鐵在鍺(111)-c(2×8)表面上的成長 50 5.2.1 室溫下蒸鍍0.6ML的鐵至鍺(111)-c(2×8)表面 50 5.2.2 加熱退火至400K 51 5.2.3 加熱退火至500K 52 5.2.4 加熱退火至570K 53 5.2.5 加熱退火至640K 55 5.2.6 加熱退火至840K 56 5.3 鐵在鍺(111)-c(2×8)表面上的形成的特殊結構分析 58 5.3.1 三角形缺陷 58 5.3.2 環狀缺陷 60 5.3.3 2x2週期性結構島 65 5.3.4 屋頂狀島 68 5.3.5 巨大平台島 73 5.3.6 巨大角錐狀島 74 5.4 不同鐵鍍量在鍺(111) - c(2×8)表面上的比較探討 75 5.4.1 表面原子團體積的變化 75 5.4.2 表面原子團成長推論 80 5.4.3 鐵鍺系統小結論 85 5.5 0.5ML鐵在銀/鍺(111) - (√3×√3)表面上的成長 86 5.5.1 室溫下蒸鍍0.5ML的鐵至銀/鍺(111)-√3×√3表面 87 5.5.2 加熱退火至400K 88 5.5.3 加熱退火至500K 89 5.5.4 加熱退火至570K 91 5.5.5 加熱退火至640K 92 5.5.6 加熱退火至740K 93 5.5.7 加熱退火至840K 95 5.6 鐵在銀/鍺(111) - (√3×√3)表面上的形成的特殊結構分析 96 5.6.1 加熱退火低溫段的平台島 96 5.6.2 2×2週期性結構島 100 5.6.3 屋頂島 101 5.6.4 角錐狀島 102 5.6.5 大型平台島 102 5.6.6 長條狀平台島 103 5.6.7 2√3×2√3基底 104 5.7 鐵鍍在銀/鍺(111) - (√3×√3)表面上的探討 106 5.7.1 表面原子團體積的變化 106 5.7.2 銀在鐵鍺系統中的作用 108 第六章 實驗結論 109 參考文獻 110

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