Author: |
童亞潔 Ya-Chieh Tung |
---|---|
Thesis Title: |
以電化學法製備多孔性奈米結構氧化鎢薄膜及其電致色變性質之研究 A Study on the Electrochromic Properties of Porous Nanostructured WO3 Thin Films Prepared by Electrochemical Method |
Advisor: |
郭金國
Kuo, Chin-Guo |
Degree: |
碩士 Master |
Department: |
工業教育學系 Department of Industrial Education |
Thesis Publication Year: | 2009 |
Academic Year: | 97 |
Language: | 中文 |
Number of pages: | 69 |
Keywords (in Chinese): | 電化學 、電致色變 、奈米結構 、氧化鎢薄膜 、穿透率 |
Keywords (in English): | Electrochemistry, Electrochromic, Nanostructure, WO3 Thin Film, Transmission |
Thesis Type: | Academic thesis/ dissertation |
Reference times: | Clicks: 245 Downloads: 9 |
Share: |
School Collection Retrieve National Library Collection Retrieve Error Report |
本研究主要為利用陽極處理法於鎢材表面生長一具有奈米管之氧化鎢薄膜,此奈米管薄膜具有良好的電化學反應性質和大表面積特性,可用於電致色變元件的還原極,用以增加電致色變元件的變色速度與顏色的鮮豔度。並探討各種條件對薄膜成份、微結構和電致色變性質的影響。
實驗結果發現,當溶液厚度為1mm時,在波長480nm處,其著色去色之穿透率變化可達42.9%,且在任何波長下均具有較高的光學密度,而薄膜元件之著色效率為η=15.2cm2/C,此薄膜元件具有最佳的可逆性。並將氧化鎢薄膜元件經過100次循環之後,其再現性和著色去色穿透率並沒有受到影響,薄膜元件的穩定性仍相當良好。
A large area and excellent properties of electrochemistry reaction on tungsten oxide (WO3) with nanotube structure film was fabricated on the metal (W) by anodization. This film can be used for electrochromic(EC) reduction electrode and to enhance the color changing speed. The objective of this study is to investigate the effects of thickness conditions on the composition, microstructure, electrochromic properties of tungsten oxide films prepared.
Experimental results at the thickness of 1mm, the transmission change between colored and bleached states at a wavelength of 480nm was 42.9%. The film obtained high optical density, and coloration efficiency was 15.2cm2/C. The reproducibility and the transmission of colored and bleached state were not affected after 100 cycles.
[1] C. G. Granqvist, E Avendano, A. Azens, “Electrochromic Coatings and Devices: Durvey of Some Recent Advances”, Thin Solid Films 442 (2003) 201-211.
[2] S. K. Deb, “A Novel Electrophotographic System”, Appl.Optics, Suppl.3 (1969) 192.
[3] B. W. Faughnan, R. S. Crandall, P. M. Heyman, “Electrochromism in WO3 Amorphous Films”, RCA Review l36 (1975) 177-197.
[4] 何國川,電化學與無窗簾時代,化工,第37卷,第3期,頁32-42(1990)。
[5] 何主亮,邱明傑,反應磁控濺鍍氧化鎢薄膜氧含量對其電致色變性質之影
響,真空科技,第12卷,第3期,頁4-15(1999)。
[6] P. R. Somani, S. Radhakrishnan, “Electrochromic materials and devices : present and future”, Materials Chemistry and Physics 77 (2002) 117-133.
[7] 謝育忠,電漿濺鍍電致色變氧化鎳薄膜特性研究與節能評估,中原大學化
學工程系,碩士論文,民國九十一年。
[8] C. M. Lampert, “Smart Switchable Glazing for Solar Energy and Daylight
Control”, Solar Energy Materials and Solar Cells 52 (1998) 207-221.
[9] D. N. Buckley, L. D. Burke, J. K. Mukahy, J. Chem. Soc, Faraday 72 (1976)
1896.
[10] L. D. Burke, E. J. M. O’sakan, J. Electroanal. Chem. 93 (1978) 11.
[11] Y. A. Yang, Y. W. Cao, B.H. Loo, J. N. Yao, J. Phys. Chem. B102 (1998) 9392.
[12] Z. S. Guan, J. N. Yao, Y. A. Yang, B. H. Loo, J. Electroanal. Chem. 443 ( 1998)
175.
[13] A. M. Andersson, W. Estrada and C. G. Granqvist, “Characterization of
electromic dc-sputtered nickel-oxide-based films”, SPIE 1272 (1990) 96-110.
[14] T. Yoshino, N. Baba, H. Masuda and K. Arai, “The Electrochemical Society
Softbound Proceedinga Series, Pennington”, (1990) 89.
[15] J. Nagao : Sol. Energy Mater. Sol. Cells 31 (1993) 291.
[16] K. Boufker : J. Appl. Electrochem.25 (1995) 797.
[17] C. K. Dyer and J. S. Lech : J. Electrochem. Soc. 125(1987) 23.
[18] Z. Gao, G. Wang, P. Li and Z. Zhao : Electrochem. Acta 36 (1991) 147.
[19] K. J. Kulesza and M. Faszynska : J. Electroanal. Chem. 252 (1988) 461.
[20] A. Avendano, A. Azens, G. A. Niklasson, C, G. Granqvist, “Sputter Deposited
Electrochromic Films and Devices Based on These : Progress on Nickel-Oxide
-Based Films”, Materials Science and Engineering B138 (2007) 112-117.
[21] C. Corbella, M. Vives, A. Pinyol, I. Porqueras, C. Person, E. Bertan, “Mfluence of The Porosity of RF Sputtered Ta2O5 Thin Films on Their Optical Properties for Electrochromic Applications”, Solid State Ionics 165 (2003) 15-22
[22] M. S. Monk, R. J. Mortimer, D. R. Rosseinsky, “Electrochromism:
Fundaments and Applications”, VCH, Weinheim, (1995) 45-46.
[23] 李淑端,有機固態電解質電致色變元件之製作,逢甲大學材料與製造工程研究所,碩士論文,民國九十二年。
[24] K. Bange, “Colouration of tungsten oxide films : A model for optically active coatings”, Solar Energy Materials & Solar Cells 58 (1999) 1-131.
[25] C. Bechinger, H. Mufer, C. Schafle, O. Sundberg, P. Leiderer, “Submicron metal oxide structures by a sol-gel process on patterned substrates”, Thin Solid Films 366 (2000) 135-138.
[26] L. Meda, Richars C., Thin Solid Films 402 (2002) 126.
[27] A. Azen, M. Kitenbergs and U.Kanders, Vacuum 46 (1995) 745-747.
[28] B. Munro, S. kramer, P.Zapp, H.Krug and H. Schmidt, “All sol-gel electrochromic system for plate glass”, Non-Crystalline Solids 218 (1997) 185-188.
[29] A. Patra, K. Auddy, D. Ganguli, J. Livage and P.K. Biswas, “Sol-gel electrochromic WO3 coatings on glass”, Mateial Letters 58 (2004) 1059-1063.
[30] J. Livage and D. Ganguli, “Sol-gel electrochromic coatings and devices: A review”, Solar Energy Material & Solar Cells 68 (2001) 365-381.
[31] R. W. Berry, P.M. Hall and M. T. Harris, “Thin Film Technology” (1980) 201.
[32] C. M. Lampert. Proc. Soc. Photo-Opt. Instrum. Eng 4458 (2001) 95.
[33] H. J. Byker, U. S. Patent, No. 5 (1992) 799.
[34] http://eetd.lbl.gov/newsletter/nl5/electro_window.html
[35] http://www.gentex.com/
[36] A. SioKou, S. Ntais, S. Papaefthimiou, G. Leftheriotis, P. Yianoulis, “Influence of the substrate on the eletrochromic characteristics of lithiated a-WO3 layers”, Surface Science 566 (2004) 1168-1173.
[37] H. Kamal, A. A. Akl, K.Abdel-Hady, “Influence of proton insertion on the conductivity, structural and optical properties of amorphous and crystalline electrochromic WO3 films”, Physica B 349 (2004)192-205.