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Author: 黃文澤
Huang, Wen-Tse
Thesis Title: 脈衝雷射蒸鍍法製備氧化銪鋅薄膜之探討:結構、光學與磁性研究
Study of Europium-doped ZnO Thin Films Grown by pulsed-laser deposition:Structural, Optical, and Magnetic Properties
Advisor: 駱芳鈺
Lo, Fang-Yuh
Degree: 碩士
Master
Department: 物理學系
Department of Physics
Thesis Publication Year: 2016
Academic Year: 105
Language: 中文
Number of pages: 44
Keywords (in Chinese): 稀磁性半導體氧化鋅順磁性
Keywords (in English): DMS, ZnO, Eu, pulsed-laser deposition
DOI URL: https://doi.org/10.6345/NTNU202204628
Thesis Type: Academic thesis/ dissertation
Reference times: Clicks: 173Downloads: 20
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  • 本論文利用脈衝雷射沉積法在氧氣壓力3×10-1 mbar、溫度750°C環境下,在c方向的藍寶石基板上製備厚度100 nm的氧化銪鋅薄膜,其中銪的原子莫耳濃度介於0~15 %之間、雷射能量密度1.6 J/cm2,檢測氧化銪鋅薄膜的結構、光學以及磁特性。
    利用XRD分析樣品成份發現所有實驗比例皆小於配方比例。X光繞射圖譜和拉曼光譜顯示樣品沒有雜晶相產生,隨著Eu摻雜濃度上升樣品粒徑大小減少。純氧化鋅PL光譜只有本質發光,缺陷發光是Eu摻雜造成,為氧間隙、鋅空缺、和氧空缺。而高濃度的氧化銪鋅(8%、10%、15%)樣品多了鋅間隙發光機制。藉由橢圓偏振光譜和穿透光譜發現銪摻雜的比例上升能隙有逐漸變大的趨勢。藉由SQUID量測3 %、5 %、8 %的氧化銪鋅薄膜在室溫及5 K的溫度下表現出順磁性。

    Pulsed-laser deposition (PLD) was applied to grow 100 nm thick Europium (Eu)-
    doped ZnO (Eu:ZnO) thin films on c-sapphire substrate under 3×10-1 mbar of Oxygan. The Eu concentration ranges from 0 to 15 at.%, temperature of substrate is 750°C, and laser fluence is 1.6 J/cm2. The deposition rate, structural properties, optical properties and magnetic properties of Eu:ZnO thin films were investigated in this study.
    Eu concentrations determined by the X-ray photoelectron spectroscopy (XPS) were slightly smaller than the nominal concentration. X-ray diffraction (XRD) and Raman-scattering spectra revealed Eu incorporation into ZnO without secondary phase. As Eu density increased, the grain size of Eu:ZnO thin films decreased. Photoluminescence (PL) spectroscopy showed that all the thin films had oxygen interstitials , zinc vacancies and oxygen vacancies. In addition, high Eu concentration thin films (8%,10%,15%) had zinc interstitials. By both spectroscopic ellipsometry and optical transmission spectroscopy, the direct band gap of Eu-doped ZnO thin films was found to increase with increasing Eu concentration. At T = 5 K and 300 K ,magnetic investigations with a superconducting quantum interference device(SQUID) magnetometer showed paramagnetism for all Eu-doped ZnO thin films.

    目錄 III Chapter 1 緒論 1 Chapter 2 背景知識 3 2.1 氧化鋅(ZnO)、銪(Eu)與藍寶石基板(Sapphire)化合物特性 3 5 2.2脈衝雷射蒸鍍法(Pulsed Laser Deposition) 5 2.2.1 原理 5 2.2.2 PLD鍍膜系統 6 2.3光致螢光(Photoluminescence) 7 2.3.1基本原理 7 2.3.2氧化鋅PL發光機制 9 2.4 X光繞射(X-Ray Diffraction) 11 2.4.1原理 11 2.4.2布拉格繞射 12 2.4.3 X-ray繞射分析 13 2.5拉曼散射光譜(Raman-scattering spectroscopy) 14 2.5.1拉曼散射光譜 14 2.5.2晶格振動模式 15 2.6 X光光電子能譜儀(X-ray photoelectron spectroscopy) 16 2.6.1原理 16 2.6.2 XPS成分比例分析 17 2.7磁性簡介 18 Chapter 3實驗過程 21 3.1鍍膜條件 21 3.2靶材製備 21 3.3藍寶石基板清洗 22 3.4鍍膜流程 22 Chapter 4 結果與討論 23 4-1氧化鋅摻雜各濃度銪元素鍍膜速率分析: 23 4-2氧化鋅摻雜不同濃度銪元素拉曼散射光譜分析 24 4-3氧化鋅摻雜不同濃度銪元素XRD分析 26 4-4 XPS結果分析 28 4.5 PL結果分析 29 4.6 Ellipsometry &Transmittance結果分析 31 4.6.1 Ellipsometry 31 4.6.2 Transmittance 33 4.7 SQUID結果分析 36 Chapter 5 總結與未來展望 39 參考文獻 41 附錄 43 SEM. 3%、5%、10%、15%氧化銪鋅 SEM圖譜 43 各比例氧化銪鋅磁元二向性(MCD)圖型: 44

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